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... a zirconium and/or hafnium-containing layer on ... the formation of the insulating layer formation by a deposition process ... "Atomic layer deposition ...
Methods of forming hafnium oxide, zirconium oxide and nanolaminates of hafnium oxide and zirconium oxide are provided. These methods utilize atomic layer deposition ...
1. Introduction. Atomic layer deposition (ALD) has recently penetrated research and development lines of several major memory and logic manufacturers due to the ...
Forming a layer of hafnium oxide by atomic layer deposition and forming a ... in which a insulating layer is ... "Atomic Layer Deposition of Zirconium-Doped ...
Methods of using atomic layer deposition to deposit a high ... Atomic layer deposition of hafnium ... Lanthanide oxide/zirconium oxide atomic layer deposited ...
The dielectric structure is formed by depositing hafnium by atomic layer deposition onto ... a insulating layer is ... "Atomic Layer Deposition of Zirconium ...
A dielectric film containing a nanolaminate with a hafnium oxide layer and a zirconium oxide layer and a method of fabricating such a dielectric film produce a ...
To form hafnium nitride by atomic layer deposition, a hafnium-containing precursor ... 1305-N include an insulating nitride layer. ... Zirconium and/or hafnium ...
The zirconium silicon oxide film may be formed by atomic layer deposition. ... including an insulating layer having a zirconium ... forming zirconium and/or hafnium ...
Atomic layer deposited HfSiON dielectric films wherein each ... Atomic layer deposited zirconium ... oxide and hafnium oxide using atomic layer deposition:
The hafnium tantalum oxynitride film may be formed using atomic layer deposition. ... metals include hafnium, yttrium, zirconium, ... an insulating nitride layer.
A dielectric layer containing an atomic layer deposited insulating metal oxide film having multiple ... Genus, Inc. Vertically ... Atomic layer deposition of ...
The metal compounds have surprisingly and significantly improved uniformity when deposited by atomic layer deposition ... Zirconium and/or hafnium ... insulating ...
The use of atomic layer deposition (ALD) to form a dielectric layer of hafnium oxide (HfO 2) doped with dysprosium (Dy) and a method of fabricating such a combination ...
... comprising depositing a hafnium compound by atomic layer deposition to ... Zirconium and/or hafnium ... Method for forming gate insulating layer having ...
To form hafnium nitride by atomic layer deposition, a hafnium-containing precursor ... 1305-N include an insulating nitride layer. ... Zirconium and/or hafnium ...
An atomic layer deposited ZrAlxOy dielectric ... Zirconium and/or hafnium ... "Atomic layer Deposition of Zirconium Titanium Oxide from Titanium ...
A capacitor structure is formed over a semiconductor substrate by atomic layer deposition ... insulating layer though an atomic ... hafnium oxide and zirconium ...
... a zirconium and/or hafnium-containing layer on a ... a substrate in a vapor deposition process. The zirconium, hafnium, ... "Atomic layer deposition" ...
... titanium and zirconium by atomic layer deposition includes ... in insulating layer: ... Deposition of hafnium oxide and/or zirconium oxide and ...
... a zirconium silicon oxide film is formed by atomic layer deposition using a zirconium precursor ... including an insulating layer having a zirconium ... hafnium ...
... a zirconium and/or hafnium-containing layer on a ... "Atomic layer deposition" ... Lanthanide oxide/zirconium oxide atomic layer deposited nanolaminate ...
Atomic layer deposited dielectric layers containing a lanthanum hafnium oxide layer and methods of fabricating such dielectric layers provide an insulating layer in a ...
... provide an insulating layer in a variety of ... hafnium by atomic layer deposition. The hafnium may be deposited ... zirconium oxide atomic layer ...
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